His experience includes a broad spectrum of technologies, including semiconductor design and manufacturing, solid-state memory, LEDs, CMOS and CCD image sensors, wireless, cable and fiber-based networking, multimedia user interfaces, and automotive entertainment systems.

David served as a staff process and modeling engineer at Lam Research Corporation for a decade, where he designed, implemented, and maintained a semi-empirical process simulator for modeling feature-scale profile evolution during plasma processing of integrated circuits. He also performed electromagnetics, fluid dynamics, and plasma discharge modeling to facilitate plasma processor development, and developed algorithms for an interferometric endpoint system. David’s doctoral research and dissertation focused on computer simulation of surface wave sustained plasma discharges. He has also conducted research on quantum effects in low temperature superconducting circuits. David is the co-author and named inventor on ten U.S. patents involving innovations in the field of plasma process development and plasma processor design. He has also authored several publications on various topics relating to plasma processing of semiconductors.

David has over 13 years of patent litigation experience working with domestic and international clients across jurisdictions, and has had particular success leveraging his technical and industry experience in the furtherance of his clients interests.